Transparent layers:
High measurement speed and push-button operation make the alpha 2.0 ideal for routine thin film qualification. Single layer dielectrics on silicon or glass substrates can be measured in seconds. Record results for easy comparison in graphical and tabular format.
Self-assembled monolayers
The phase information of the spectroscopic ellipsometric measurement is highly sensitive to very thin layers
Absorbing layers
Advanced models provide fast and efficient fitting for the wide range of materials you may encounter.
Coatings on glass
Patented technology enables accurate measurements on any substrate: metal, semiconductor, glass... On transparent substrates, alpha 2.0 simultaneously measures depolarization to correct for the effect of light reflected from the back of the substrate. This unwanted light can confuse other ellipsometers, but the alpha 2.0 provides an accurate determination of thickness and optical constants.
The high sensitivity of alpha 2.0 technology provides microstructural details that cannot be obtained from reflectance measurements. For example, when measuring a thin titanium dioxide layer with alpha 2.0, its refractive index was found to vary between the substrate and the surface. The gradient model with a rough surface thus best describes the description of this sample.
| Materials |
Models |
- a-Si
- poly-Si
- DLC (diamond-like carbon)
- Organic materials
- OLED films
- SiC
- Photoresist
- Colour filters for displays
- Metals
|
- Lorentz
- Gauss
- Drude
- Tauc-Lorentz
- B-Spline
- ...and many others
|
