In early October 2016, we installed a direct-write laser lithography system, the MicroWriter ML2, at the Institute of Photonics and Electronics. It will be used here to create micro and nanostructures and functional biomolecular arrays as part of our research into optical sensors and surface plasmons.
The MicroWriter is a flexible photolithography system designed for development and prototype work and for low volume production. It uses direct laser writing methods at wavelengths of 405 nm, 365 nm or more recently 385 nm. The system can achieve resolutions down to 0.6 µm. The main advantages include high writing speed, large working area, the ability to map the area and make corrections for height irregularities before actual writing and ease of operation.
Parameters
- Substrate size : 230 mm x 230 mm x 15 mm
- Maximum recordable area : 195 mm x 195 mm
- Achievable resolution : 0.6 µm, 1 µm, 2 µm, 5 µm
- Available wavelengths : 385 nm as standard, 405 nm and 365 nm as options
- Writing speed : 25 mm2/min to 180 mm2/minute
