For the client's brief we chose the Microwriter ML3 Pro from UK manufacturer Durham Magneto Optics Ltd (DMO).
This is an assembly suitable for microfluidics as well as for microcontacting, MEMS, waveguide or lab-on-a-chip applications.
The 385 nm wavelength and high optical power illumination source enables writing to conventional g-line and h-line photoresist, as well as the popular SU-8 i-line photoresist and others.
The integrated profilometer function allows, among other things, verification of writing after structure development.
Other key features include the ability to write in grayscale, a 10x lens for high resolution (1 µm) and a second lens with a large depth of field for structures with a high height-to-width ratio (5 µm resolution).
The supplied setup can be expanded in the future to higher resolution, with temperature stabilization, virtual mask projection, alignment by markers on the back of the wafer, a second illumination wavelength, and other functionality.
Device parameters
- Source wavelength: 385 nm
- Write resolution: 1 µm and 5 µm
- Number of lenses: 2 (3x to 10x magnification)
- Other features: Wide field viewer, integrated profilometer, autofocus, focus lock, virtual rotation, auto sample centering, auto edge detection
