Optical lithograph for micro-contacting

The assembly enables the writing of high-resolution structures with the ability to write over large areas and several sub-millimeter fragments simultaneously.

Multiple writing with precise alignment and virtual preview before writing.

Illumination source suitable for a wide range of photoresists (g-, h-, i-line and broadband photoresists)

Stable system for time-consuming, large-scale, high-resolution recording.

• Micro-contacting with precise alignment (< 500 nm)
• Fast, large-area writing with temperature stabilization
• High resolution: 400 nm

In January 2021 we installed a Microwriter ML3 Pro from the British manufacturer Durham Magneto Optics Ltd. (DMO) for the J. Heyrovsky Institute of Physical Chemistry, CAS.

This is a 400 nm resolution assembly with a high precision positioning system.

The 385 nm wavelength illumination source with high optical power allows writing to conventional g-line and h-line photoresist, but also to the popular SU-8 i-line photoresist.

Temperature stabilization ensures maximum stability even for longer writing tasks.

The integrated profilometer function enables, among other things, verification of the write after structure development.

The Virtual Mask Aligner (VMA) function for precise alignment of the write to existing structures serves for accurate and easy micro-contacting. In addition, the Microwriter ML3 also allows grayscale writing.

Device parameters

• Source wavelength: 385 nm
• Temperature stabilization: ± 0.25 °C
• Writing resolution: 400 nm, 600 nm, 1000 nm, 2000 nm and 5000 nm
• Number of lenses: 5 (3x to 50x magnification)

Additional features: VMA, wide field viewer, integrated profilometer, autofocus, focus lock, virtual rotation, auto sample centering, auto edge detection