In August 2021 we installed a Microwriter ML3 Pro from the British manufacturer Durham Magneto Optics Ltd. (DMO) for the Institute of Analytical Chemistry, CAS. One of the main applications is the creation of structures for spintronics (e.g. for the investigation of spintronic Hall effects).
It is a kit with selectable resolution in the range of 0.4 µm to 5 µm, with a high-precision positioning system.
The illumination source with a wavelength of 385 nm and high optical power is optimal for i-line photoresist, but also allows writing to conventional g-line and h-line photoresist.
Temperature stabilization ensures maximum stability even for longer writing jobs (typically for combinations of high resolution and large area or writing on multiple samples of different sizes).
The integrated profilometer function allows, among other things, verification of writing after structure development.
The Virtual Mask Aligner (VMA) function for precise alignment of the write to existing structures serves for accurate and easy micro-contacting. In addition, the Microwriter ML3 also allows grayscale writing.
Device parameters
- Source wavelength: 385 nm
- Temperature stabilization: ± 0.25 °C
- Writing resolution: 400 nm, 600 nm, 1000 nm, 2000 nm and 5000 nm
- Number of lenses: 5 (3× to 50× magnification)
- Write area: 195 mm × 195 mm
Additional features: VMA, wide field viewer, integrated profilometer, autofocus, focus lock, virtual rotation, auto sample centering, auto edge detection, auto marker recognition
