Filmetrics® F54-XY-200 and F54-XY-300

The Filmetrics® F54-XY series provides automated mapping of thin film thickness, refractive index, reflectivity, absorption, and surface roughness on samples up to 300 mm. It offers five configurations with measurement ranges from 4 nm to 120 µm and spot sizes from 2 µm to 100 µm.

Key Features

Support for both structured and unstructured samples
Configurations with wavelength ranges from 190 to 1700 nm
Minimum measuring spot size of 5 µm
Autofocus and pattern recognition
Safety cover with interlock
Live video image
Support for samples up to 300 mm in diameter
User-definable mapping points (rectangular, linear, polar, and custom configurations)
Manual or automatic sample alignment
Advanced history for saving, reproducing, and plotting results
Built-in reference and thickness standards
Extensive material library and advanced modeling algorithms

Expert advisor

Ing. Richard Schuster

+420 601 123 593

schuster@optixs.cz

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OptiXs care

We will expertly consult your planned application
Our team is able to integrate the product into a larger system
We ensure fast delivery of spare parts and local service

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Product description

The Filmetrics® F54-XY-200 and F54-XY-300 automated systems measure the thickness of thin layers on structured and unstructured samples up to 200 mm and 300 mm in diameter, respectively. Mapping is performed using an advanced spectral reflectance system and Filmetrics algorithms.

The compact system brings accurate measurement positioning to manufacturing applications. The motorized XY-200 stage automatically moves to specified measurement locations and provides results at a rate of up to two points per second. Measurement of 300 mm diameter wafers is supported by an additional high-performance rotary stage in the F54-XYT-300 configuration.

Applications

Semiconductor process films – measurement of the thickness of polysilicon, photoresists, oxides, nitrides, and SOI layers; measurement of thinned silicon.
Compound semiconductors – measurement of thickness and optical properties of layers and wafers (e.g., GaN, SiC).
LCD displays – measurement of cell gaps and thickness of polyimides, ITO and TCO layers.
Optical coatings and electro-optical films – measurement of the thickness of hardcoats, anti-reflective layers, and filters (modeling of more than 10 layers).
Coatings for medical applications – measurement of the thickness and homogeneity of parylene and other protective coatings on implants; possibility of automated measurement of sample fields.
MEMS – measuring the thickness of photoresists, silicon membranes, and dielectric layers, mapping homogeneity to detect defects.

Parameters

F54-XY configuration – select the appropriate model according to the measurement range

Model	Thickness range*	Spectral range
F54-XY	20 nm – 50 µm	380 – 1050 nm
F54-XY-UV	4 nm – 35 µm	190 – 1100 nm
F54-XY-NIR	100 nm – 120 µm	950 – 1700 nm
F54-XY-EXR	20 nm – 120 µm	380 – 1700 nm
F54-XY-UVX	4 nm – 120 µm	190 – 1700 nm

* Depending on the material and lens.

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