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Crylas

Areas of application:

Raman spectroscopy | lithography | interferometry | metrology | optical measurement

eMopa Series Pulsed Lasers

CryLaS EMOPA-Series lasers are UV lasers with a wavelength of 266 nm based on the MOPA (Master Oscillator Power Amplifier) principle. They combine a very narrow spectral line, high beam quality, and higher output power, making them suitable for applications where a stable UV source with high coherence and simultaneously higher power than standard single-frequency lasers is required.

Highlights

  • Wavelength: 213, 266, 355 and 532 nm
  • Pulse energy: up to 200 µJ
  • Peak power: up to 182 kW

Key Features

  • UV laser with a wavelength of 266 nm
  • MOPA principle for power enhancement
  • narrow spectral line suitable for precise optical applications
  • high beam quality (TEM00)
  • stable output power
  • suitable for demanding laboratory and industrial applications
  • design optimized for long-term operation

Product description

UV Laser with MOPA Principle

EMOPA-Series lasers utilize the Master Oscillator Power Amplifier concept, where the basic laser oscillator is supplemented by an amplification stage. This solution allows for increased output power while maintaining a narrow spectral line and good beam quality.

Higher Power while Maintaining Stability

Thanks to the amplification stage, these lasers achieve higher power than standard single-frequency UV sources, while retaining the properties necessary for precise optical measurements.

Suitable for Precise Optical Applications

Lasers in this series are intended for applications requiring stable UV radiation with high coherence and a quality beam, such as in research, metrology, or advanced optical systems.

Parameters

Variant Wavelength Pulse Energy Average Power Max. Repetition Rate Peak Power
eMOPA213-20 213 nm 20 µJ 20 mW 1000 Hz 33 kW
eMOPA266-40 266 nm 40 µJ 40 mW 1000 Hz 50 kW
eMOPA355-100 355 nm 100 µJ 100 mW 1000 Hz 111 kW
eMOPA532-200 532 nm 200 µJ 200 mW 1000 Hz 182 kW

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