We distribute this product only in the Czech Republic and Slovakia.

Probes for measuring the process on the substrate surface

Probes from Impedans for measuring processes on the substrate surface - real-time measurements of the ion flux and energy distribution function of ions impacting on the surface using a simulated substrate with integrated sensors, possibly in combination with an integrated quartz crystal microbalance (QCM), which is used to measure the ion energy distribution function and the ratio of ion-neutral deposition on the surface inside the plasma reactor. The product offering includes the Semion RFEA System, Semion 3 keV System, Semion Pulsed DC, Quantum RFEA System and Vertex RFEA System.

Key Features

  • Sensor elements and bracket available in aluminum, anodized aluminum, or stainless steel.
  • Suitable for grounded, floating and RF biased conditions
  • Interchangeable sensor elements with different sensitivities ranging from 0.001 A m-2 to 700 A m-2.
Probes for measuring the process on the substrate surface
Probes for measuring the process on the substrate surface Probes for measuring the process on the substrate surface Probes for measuring the process on the substrate surface Probes for measuring the process on the substrate surface
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Impedans
Martin Klečka
Expert advisor

Ing. Martin Klečka

+420 607 014 278

klecka@optixs.cz

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  • We will expertly consult your planned application
  • Our team is able to integrate the product into a larger system
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Products

Semion RFEA System

Semion RFEA System

RFEA analyzer designed for real-time measurement of ion flux and ion energy distribution function (IEDF) incident on a surface using a simulated substrate with integrated sensors.

Key Features:

  • Ion flux and energy distribution measurements with energy ranges up to 3000 eV (depending on processes).
  • Up to 13 sensor elements distributed around the simulated substrate for measuring ion energy uniformity and ion flux on the substrate in industrial applications.
Semion 3 keV System

Semion 3 keV System

RFEA analyzer for real-time ion flux and ion energy distribution function (IEDF) measurements with up to 3 keV RF voltage, three times higher than the standard Semion system. The sensor consists of an anodized aluminum wafer (standard version) with a single sensing element.

Key Features:

  • Measurement of ion flux and energy distribution with an energy range up to 3000 eV (depending on processes).
  • Fully automated software analysis including IEDF adjustment for potential DC sensor bias.
Semion Pulsed DC

Semion Pulsed DC

System for precise measurements of plasma and plasma parameters, such as measuring the ion energy distribution function (IEDF) of ions incident on a surface. Semion Pulsed DC is a key system for measuring the time evolution of ion energy and flux at different times. It is the only commercially available RFEA technology on the market with sub-microsecond temporal resolution. These features make it a key device for plasma process diagnostics.

Key Features:

  • Energy range up to 2000 eV (depending on processes) and frequency range from DC to 350 kHz.
  • Fully automated software analysis including IEDF matching for potential bias by DC sensor.
Quantum RFEA System

Quantum RFEA System

The Quantum system consists of an RFEA analyzer and an integrated quartz crystal microbalance (QCM), which is used to measure the ion energy distribution function (IEDF) and the ratio of ion neutral deposition on the surface inside the plasma reactor. The system measures and displays the deposition rate, IEDF, ion flux and voltage at the surface where the probe is located. Using crystals that are coated with a special material, it can also measure the rate of etching of ions and neutrals. All this without the need for water cooling.

Key features:

  • Measures ion flux and energy distribution with an energy range of up to 3000 eV (depending on processes).
  • Fully automated software analysis including IEDF matching for potential bias by DC sensor.
  • Mounting capability on electrically biased surfaces including e.g. radio frequency (RF).
  • Unique shielding structure allows accurate detection of millivolt, 6 MHz, crystal oscillation frequency levels in the presence of RF bias up to 900 V.
Vertex RFEA System

Vertex RFEA System

RFEA analyzer for real-time measurement of ion flux and ion energy distribution function (IEDF) incident on a surface using a simulated substrate with integrated sensors.

Key Features:

  • Ion flux and energy distribution measurements in the range up to 2000 eV (depending on processes).
  • Configurable aspect ratios (AR) ranging from 0.5 to 20 with 0.5 resolution
  • Up to 13 sensors integrated into a single holder for measurement unity.
  • Mounts with different geometries on request
  • Fully automated software analysis including IEDF matching for sensor DC bias potential.

Dokumenty

Semion_DS-0006-01

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Semion_BR-0006-03

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Semion_3keV_BR-0015-02-1

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Semion_3keV_DS-0015-01

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Semion_pdc_DS-0012-01

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Semion-pDC-BR-0012-03-1

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Quantum_BR-0013-04

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Vertex_BR-0008-04

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Inquire product

Are you interested in product? Send us your requirements via the enquiry form or contact an expert consultant directly. We will be happy to answer your questions and propose a solution according to your needs.

Expert advisor

Martin Klečka

Ing. Martin Klečka

tel: +420 607 014 278
mail: klecka@optixs.cz