Optical lithograph Microwriter ML3 Pro

The assembly enables the writing of high-resolution structures with the ability to write large areas and several sub-millimeter fragments simultaneously.

Multiple writing with precise alignment and virtual preview before writing.

The illumination source of the assembly had to be suitable for a wide range of photoresists (g-, h-, i-line and broadband photoresists).

A stable system for time-consuming, large-scale, high-resolution recordings.

Furthermore:

• Micro-contacting with precise alignment (<< 500 nm)
• Fast, large-area writing with temperature stabilization
• High resolution: 600 nm
• Large-area writing up to 195 mm x 195 mm
• Formation of waveguide and other photonic structures

Microwriter ML3 Pro from British manufacturer Durham Magneto Optics Ltd. (DMO).

It is a 600 nm resolution assembly with a high precision positioning system.

The 385 nm wavelength illumination source with high optical power allows writing on conventional g-line and h-line photoresist, as well as the popular SU-8 i-line photoresist.

Temperature stabilization ensures maximum stability even for longer write jobs.

The integrated profilometer function allows, among other things, verification of the write after structure development.

The Virtual Mask Aligner (VMA) function for precise alignment of the write to existing structures serves for accurate and easy micro-contacting. Grayscale enrollment is possible.

Device parameters

• Source wavelength: 385 nm
• Temperature stabilization: ± 0.25 °C
• Write resolution: 600 nm, 1000 nm, 2000 nm and 5000 nm
• Number of lenses: 4 (3x to 20x magnification + digital zoom)
• Additional features: VMA, wide field viewer, integrated profilometer, autofocus, focus lock, virtual rotation, auto sample centering, auto edge detection